The Microscopy and Microanalysis instruments provide a range of advanced characterization methods for both “hard” and “soft” materials. This facility has a 200 keV TEM for study of hard materials; one configured for high resolution imaging, the other for routine imaging and microanalysis, and a second TEM ( A LEO 912 with energy filter) is configured for soft and hard materials. A state-of-the-art, aberration corrected, atomic resolution field emission STEM with EDS and GIF with CCD camera will be installed in late 2008 (FEI Titan). Current characterization equipment includes (i) Three field emission SEMs (LEO 1530s with EDS, EBSD and Nabity pattern generators), and a JEOL 6100 W SEM for low resolution work.; (ii) A Ziess 1540 Focused Ion Beam/FESEM (iii) two TEMs -Philips(FEI) CM-200 Ultra twin FE-TEM and an EDS system and a LEO 912 120 keV LaB6 TEM with a CCD camera, energy filter, and a cryo-transfer system; (iv) An AFM for hard materials and soft materials and in situ studies – and a Zygo optical interferometer for surface roughness studies; (v) a Perkin-Elmer/Phi Auger; (νi) a Phi ESCA system; (vii) a LEO 1540 cross beam FIB system. A recent addition is a JY LabRAM ARIMAS micro-Raman spectroscopy system equipped for studies of bulk, micron sized and thin film/surface samples, including full spectral imaging capability.